Company Filing History:
Years Active: 2022-2023
Title: Innovations of Wei-Hsien Chen
Introduction
Wei-Hsien Chen is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of materials science, particularly in the development of anti-glare films. With a total of 2 patents to his name, his work has garnered attention for its innovative approaches and practical applications.
Latest Patents
Wei-Hsien Chen's latest patents include advancements in anti-glare film technology. One of his patents discloses an anti-glare film that comprises a transparent substrate and an anti-glare layer made from an acrylic binder resin, a polyether-modified siloxane, and a plurality of silica nanoparticles. The unique feature of this film is that the silica nanoparticles are flocculated into micro-floccules with an average secondary particle diameter ranging from 1,500 nm to 3,100 nm. This design allows the anti-glare film to provide reliable anti-glare properties with low haze and a fine surface. Another patent focuses on an anti-glare film that utilizes a poly(methyl methacrylate) (PMMA) base film. This film includes an anti-glare layer made from an acrylic binder resin and organic microparticles. The anti-glare layer features a miscible sub-layer that encourages the organic microparticles to migrate toward the upper portion, creating an uneven surface that enhances its anti-glare properties.
Career Highlights
Wei-Hsien Chen is currently employed at Benq Materials Corporation, where he continues to innovate in the field of materials. His work has not only advanced the technology of anti-glare films but has also contributed to the broader field of optical materials.
Collaborations
Throughout his career, Wei-Hsien Chen has collaborated with notable colleagues, including Gang-Lun Fan and Kuo-Hsuan Yu. These collaborations have further enriched his research and development efforts.
Conclusion
Wei-Hsien Chen's contributions to the field of anti-glare film technology exemplify his innovative spirit and dedication to advancing materials science. His patents reflect a commitment to creating practical solutions that enhance everyday products.