Nagoya, Japan

Wataru Shionoya



Average Co-Inventor Count = 2.2

ph-index = 2

Forward Citations = 19(Granted Patents)


Location History:

  • Nagoya, JP (2002 - 2011)
  • Okazaki, JP (2013)

Company Filing History:


Years Active: 2002-2013

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5 patents (USPTO):Explore Patents

Title: Wataru Shionoya: Innovator in Plasma Technology

Introduction

Wataru Shionoya is a prominent inventor based in Nagoya, Japan. He has made significant contributions to the field of plasma technology, holding a total of 5 patents. His innovative work focuses on reactor structures and plasma treatment apparatuses, showcasing his expertise in electrical engineering and applied physics.

Latest Patents

Shionoya's latest patents include a reactor structure and a plasma treatment apparatus. The reactor structure patent describes a design where the distance from the negative output terminal of a secondary winding of a transformer to the feeding terminal of the cathode plate is longer than the distance from the positive output terminal to the feeding terminal of the anode. This design ensures that the anode side feeding path electrically connects the feeding terminal of the anode bar to the positive output terminal, while the cathode side feeding path connects the feeding terminal of the cathode plate to the negative output terminal. Notably, the path length of the cathode side feeding path is longer than that of the anode side feeding path, and the housing is formed by an electric conductor connected to the cathode side feeding path.

The plasma treating apparatus patent outlines a system that includes a first electrode, a second electrode, and a third electrode positioned within a passage. The second electrode is located upstream of the first electrode, while the third electrode is downstream. A connecting line links the first electrode to a first pole of a pulsed power supply, and the second and third electrodes to a second pole. The first electrode occupies part of the first gas passing surface, while the second and third electrodes occupy parts of the second and third gas passing surfaces, respectively.

Career Highlights

Wataru Shionoya is currently employed at NGK Insulators, Inc., where he continues to develop innovative technologies. His work has significantly advanced the understanding and application of plasma technology in various industries.

Collaborations

Shionoya has collaborated with notable colleagues, including Katsuji Iida and Tatsuhiko Hatano. Their combined expertise has contributed to the successful development of advanced plasma technologies.

Conclusion

Wataru Shionoya is a distinguished inventor whose work in plasma technology has led to multiple patents and advancements in the field. His contributions continue to influence the industry and inspire future innovations.

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