Wataru Nishida

Title: Wataru Nishida: Innovator in EUV Lithography

Introduction

Wataru Nishida is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of lithography, particularly in the development of reflective mask technology for extreme ultraviolet (EUV) lithography.

Latest Patents

Nishida holds a patent for a reflective mask blank, which includes a substrate, a multilayer reflective film that reflects EUV light, a protection film, and an absorption film. This innovative design ensures that the substrate, multilayer reflective film, protection film, and absorption film are arranged in a specific order from bottom to top. The protection film features an upper layer made of a rhodium-based material, which is crucial for enhancing the performance of EUV lithography.

Career Highlights

Wataru Nishida is currently employed at AGC Inc., where he continues to push the boundaries of technology in the semiconductor industry. His work has been instrumental in advancing the capabilities of EUV lithography, which is essential for the production of smaller and more efficient electronic components.

Collaborations

Nishida collaborates with talented colleagues, including Daijiro Akagi and Hiroaki Iwaoka, who contribute to the innovative projects at AGC Inc. Their teamwork fosters an environment of creativity and technical excellence.

Conclusion

Wataru Nishida's contributions to EUV lithography through his innovative patent demonstrate his expertise and commitment to advancing technology in the semiconductor field. His work continues to influence the industry and pave the way for future innovations.