Company Filing History:
Years Active: 1996-1998
Title: Innovations of Wan-Lin Chen in DNA-Cleaving Agents
Introduction
Wan-Lin Chen is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of chemistry, particularly in the development of photo-induced DNA-cleaving agents. With a total of 2 patents, his work has implications for various applications in molecular biology and genetic research.
Latest Patents
Wan-Lin Chen's latest patents focus on a composition of photo-induced DNA-cleaving agents. The invention discloses a composition that comprises N-aryl-N-(alkyl or arylalkyl)hydroxylamine. This compound is stable in the dark but reacts with O₂ to form HO· radicals when exposed to UV light for a period of 2-3 hours. These radicals then interact with DNA, leading to its cleavage. This innovative approach has the potential to advance research in genetic manipulation and therapeutic applications.
Career Highlights
Wan-Lin Chen is affiliated with the National Science Council, where he continues to explore and develop innovative solutions in his field. His research has garnered attention for its potential applications in biotechnology and medicine.
Collaborations
Some of his notable coworkers include Jih Ru Hwu and Shwu-chen Tsay. Their collaborative efforts contribute to the advancement of research in the field of DNA-cleaving agents.
Conclusion
Wan-Lin Chen's contributions to the development of photo-induced DNA-cleaving agents highlight his innovative spirit and dedication to advancing scientific knowledge. His work is poised to make a lasting impact in the fields of molecular biology and genetic research.