Wan Hsueh Lai

Title: Innovations of Wan Hsueh Lai in Substrate Process Detection

Introduction

Wan Hsueh Lai is an accomplished inventor based in New Taipei, Taiwan. She has made significant contributions to the field of substrate process detection through her innovative use of machine learning. Her work focuses on enhancing the efficiency and accuracy of metrology measurements in substrate processes.

Latest Patents

Wan Hsueh Lai holds a patent for a groundbreaking method titled "Substrate process endpoint detection using machine learning." This patent outlines methods and systems for detecting the endpoint of a substrate process. A set of machine learning models is trained to provide a metrology measurement value associated with a specific type of metrology measurement for a substrate based on spectral data collected for the substrate. The respective machine learning model is selected for future spectral data collected during a substrate process, based on a performance rating associated with the particular type of metrology measurement. Current spectral data is collected during a process for a substrate and provided as input to the respective machine learning model. An indication of a metrology measurement value corresponding to the substrate is extracted from the outputs of the trained machine learning model. If the metrology measurement satisfies a criterion, an instruction to terminate the current process is generated.

Career Highlights

Wan Hsueh Lai is currently employed at Applied Materials, Inc., where she continues to develop innovative solutions in the field of substrate processing. Her expertise in machine learning and metrology has positioned her as a key contributor to advancements in this area.

Collaborations

Some of her notable coworkers include Pengyu Han and Lei Lian, who collaborate with her on various projects within the company.

Conclusion

Wan Hsueh Lai's contributions to substrate process detection through machine learning exemplify the impact of innovation in technology. Her patent and ongoing work at Applied Materials, Inc. highlight her role as a leading inventor in this field.