Waltraud Dietl

Title: Waltraud Dietl: Innovator in Heat Treatment Technology

Introduction

Waltraud Dietl is a prominent inventor based in Illerkirchberg, Germany. She has made significant contributions to the field of heat treatment technology, particularly in the processing of disc-shaped substrates such as semiconductor wafers. Her innovative approach has led to the development of a unique apparatus that enhances the efficiency and effectiveness of heat treatment processes.

Latest Patents

Waltraud Dietl holds a patent for an "Apparatus for the heat treatment of disc shaped substrates." This invention relates to a specialized apparatus designed for the heat treatment of semiconductor wafers. The apparatus features at least one radiation source and a treatment chamber that accommodates the substrate. It includes upper and lower wall elements, with at least one wall element being substantially transparent to the radiation emitted by the source. Additionally, the apparatus is equipped with a first gas inlet apparatus that enhances the treatment process.

Career Highlights

Throughout her career, Waltraud Dietl has demonstrated a commitment to innovation in her field. Her patent reflects her expertise and dedication to improving heat treatment technologies. With a focus on practical applications, she has contributed to advancements that benefit the semiconductor industry.

Collaborations

Waltraud has collaborated with notable colleagues, including Patrick Schmid and Eddy Jager. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and expertise, further enhancing the development of innovative technologies.

Conclusion

Waltraud Dietl's contributions to heat treatment technology exemplify her role as a leading inventor in her field. Her patented apparatus for the heat treatment of disc-shaped substrates showcases her innovative spirit and commitment to advancing technology.