Walter S Piskorowski, Jr

Title: Walter S Piskorowski, Jr: Innovator in Optical Technologies

Introduction

Walter S Piskorowski, Jr. is a notable inventor based in Spencerport, NY (US). He has made significant contributions to the field of optical technologies, holding a total of 2 patents. His work primarily focuses on enhancing the performance of optical systems through innovative designs.

Latest Patents

Piskorowski's latest patents include a "Polygon mirror having high reflectance and uniform reflectance over" and a "Composite optical interference filter for use in film scanner system." The polygon mirror patent describes a laser imaging system that utilizes a moving mirror to repetitively reflect a laser beam, achieving greater than 90% reflectance over a range of incidence angles. The composite optical interference filter patent outlines a filter designed for a film scanning system, which provides color balance, notch rejection, and IR rejection through multiple, alternating layers of thin film oxides.

Career Highlights

Walter S Piskorowski, Jr. is currently employed at Eastman Kodak Company, where he continues to innovate in the field of imaging technologies. His work has contributed to advancements in film scanning and laser imaging systems, showcasing his expertise in optical engineering.

Collaborations

Throughout his career, Piskorowski has collaborated with talented individuals such as Anna L Hrycin and James R Milch. These collaborations have fostered a creative environment that has led to the development of cutting-edge technologies in the optical domain.

Conclusion

Walter S Piskorowski, Jr. stands out as an influential inventor in the realm of optical technologies. His patents reflect a commitment to improving imaging systems, and his work at Eastman Kodak Company continues to shape the future of this field.