Dallas, TX, United States of America

Walter L Kriss


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1993

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1 patent (USPTO):Explore Patents

Title: The Innovations of Walter L. Kriss

Introduction

Walter L. Kriss, an inventor based in Dallas, TX, has made significant contributions to the field of semiconductor technology. With one notable patent to his name, Kriss has developed innovative methods that enhance the manufacturing process of critical materials used in electronic devices.

Latest Patents

Walter L. Kriss holds a patent for a "Reflux Annealing Device and Method." This invention pertains to the annealing of Hg.sub.1-x Cd.sub.x Te slices within a specialized mercury reflux chamber. The unique design includes a mercury reservoir at the bottom paired with condensation regions at the top. The patent outlines a process where the chamber is heated by a furnace, generating an annealing region that encompasses both the reservoir and a holder for the Hg.sub.1-x Cd.sub.x Te slices. In preferred embodiments, the mercury reservoir is heated to 270°C for periods ranging from two hours to sixty days. Additionally, the invention describes a method of annealing immediately following Liquid Phase Epitaxy (LPE) growth, utilizing either mercury vapor from the melt or a separate reservoir.

Career Highlights

Walter L. Kriss is associated with Texas Instruments Corporation, a leading semiconductor company renowned for its innovations in the electronics sector. His work has played a crucial role in advancing the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Kriss has collaborated with prominent experts in his field, including John H. Tregilgas and Donald F. Weirauch. Together, they have contributed to the development of technologies that enhance the capabilities of electronic systems.

Conclusion

Walter L. Kriss stands out as an inventor whose work in the semiconductor industry has ushered in innovative methodologies. His patent for the reflux annealing device demonstrates his commitment to improving manufacturing techniques, cementing his role as a key figure in the ongoing evolution of electronic materials.

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