Walter Jorg

Title: Innovations of Walter Jorg in Conductive Path Formation

Introduction

Walter Jorg is an accomplished inventor based in Stuttgart, Germany. He is known for his innovative contributions to the field of electrical engineering, particularly in the formation of conductive paths on substrates. His work has significant implications for the development of electronic components.

Latest Patents

Walter Jorg holds a patent for a method of forming conductive paths on a substrate containing depressions. This invention addresses the challenge of creating electric conductors at a very short distance from the ends of depressions, such as V-grooves, on a substrate. In one configuration, a film of PTFE or a similar material is laminated over the entire surface of the substrate. Holes are then etched in the film, which are subsequently metallized to form conductive paths that are electrically connected to these holes. The film in the area of the grooves is removed by etching. In another configuration, the grooves are temporarily filled with a photoresist, and the conductive paths and contact surfaces are formed using a photolithographic method.

Career Highlights

Walter Jorg has made significant strides in his career, particularly through his work at Alcatel N.V. His innovative methods have contributed to advancements in the electronics industry, showcasing his expertise in the field.

Collaborations

Walter has collaborated with notable colleagues, including Horst Richter and Johann Springer. Their combined efforts have furthered the development of innovative technologies in electrical engineering.

Conclusion

Walter Jorg's contributions to the field of conductive path formation demonstrate his innovative spirit and technical expertise. His patent reflects a significant advancement in the manufacturing of electronic components, paving the way for future developments in the industry.