This inventor holds 1 USPTO granted patent. Top assignee: Agfa Gevaert Nv. Active years: 1981.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1981
Title: Walter F. DeWinter: Innovator in Photosensitive Compositions
Introduction
Walter F. DeWinter is a notable inventor based in S-Gravenwezel, Belgium. He has made significant contributions to the field of photosensitive compositions, particularly in the production of polymer resist images. His work has been instrumental in advancing technologies that rely on these materials.
Latest Patents
Walter F. DeWinter holds a patent for a photosensitive composition containing an ethylenically unsaturated compound. This innovative composition is designed for the production of polymer resist images, showcasing his expertise in the field. The patent highlights his ability to create effective solutions for complex challenges in material science.
Career Highlights
Walter F. DeWinter is associated with Agfa Gevaert NV, a company known for its advancements in imaging technology. His role at Agfa Gevaert has allowed him to collaborate with other talented professionals in the industry. His contributions have helped the company maintain its reputation as a leader in imaging solutions.
Collaborations
Throughout his career, Walter has worked alongside notable colleagues such as Urbain Leopold Laridon and Hendrik E. Kokelenberg. These collaborations have fostered an environment of innovation and creativity, leading to the development of groundbreaking technologies.
Conclusion
Walter F. DeWinter's work in photosensitive compositions has made a lasting impact on the field of imaging technology. His patent and collaborations reflect his commitment to innovation and excellence.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile