West Covina, CA, United States of America

Walter D Chapman


Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Walter D Chapman: Innovator in UV Light Technology

Introduction

Walter D Chapman is a notable inventor based in West Covina, California. He has made significant contributions to the field of ultraviolet (UV) light technology. His innovative approach has led to the development of a unique gas discharge tube that enhances UV light output.

Latest Patents

Walter D Chapman holds a patent for the "Long arc column gas discharge tube." This invention features a low-pressure UV light source that produces a high-intensity output, which is proportional to the inside diameter and length of the arc discharge column. The design includes a cathode and anode housed within a high-density ceramic body, along with a sapphire window aligned with the arc discharge column. The anode is positioned at the end opposite the sapphire window, while the cathode is located outside the arc discharge column, allowing the arc to move through an aperture. As electrons traverse the low-pressure gas, ionization occurs, releasing photons in the UV spectrum. The cumulative effect of these photons generates high-intensity UV radiation that exits the lamp through the sapphire window. Walter D Chapman has 1 patent to his name.

Career Highlights

Walter D Chapman is associated with Alta Advanced Technologies, Inc., where he continues to innovate in the field of UV light technology. His work has been instrumental in advancing the applications of UV light sources in various industries.

Collaborations

Walter has collaborated with notable coworkers, including Steven G Boland and Steven H Boland, contributing to the development of cutting-edge technologies in their field.

Conclusion

Walter D Chapman is a distinguished inventor whose work in UV light technology has paved the way for advancements in the industry. His innovative spirit and dedication to research continue to inspire future developments in this area.

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