Volker Mattern

Title: Volker Mattern: Innovator in Plasma Etching Technology

Introduction

Volker Mattern is a notable inventor based in Böblingen, Germany. He has made significant contributions to the field of plasma etching technology, holding a total of 2 patents. His work focuses on enhancing the etching process for substrates with low thermal conductivity, particularly in the semiconductor industry.

Latest Patents

Mattern's latest patents include an "Apparatus for plasma or reactive ion etching" and a "Method of etching substrates having a low thermal conductivity." These inventions disclose a vacuum reactor designed to achieve a high degree of etch rate uniformity. The substrates are arranged in a holder at a predetermined spacing from the cathode, which is energized by RF energy. A key feature of his design is the cathode's elevation to within approximately 0.2 mm from the substrate's bottom side, made of aluminum and equipped with a layer that acts as a black radiator. This innovative approach allows for efficient heat removal during the reactive ion etching process.

Career Highlights

Volker Mattern is currently associated with the International Business Machines Corporation (IBM), where he continues to develop cutting-edge technologies in the field of plasma etching. His expertise has positioned him as a valuable asset in the research and development sector.

Collaborations

Mattern has collaborated with esteemed colleagues such as Johann W Bartha and Thomas Bayer, contributing to advancements in etching technology and enhancing the capabilities of their projects.

Conclusion

Volker Mattern's contributions to plasma etching technology have made a significant impact in the industry. His innovative patents and collaborations reflect his dedication to advancing the field.