This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignees: Ibeam Materials, Inc., Samsung Electronics Co., Ltd.. Active years: 2024-2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
2 out of 9 
2 out of 132,108 
Years Active: 2024-2025
Title: Innovations of Vladmir Matias
Introduction
Vladmir Matias is an accomplished inventor based in Santa Fe, NM (US). He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative spirit and technical expertise.
Latest Patents
His latest patents include a groundbreaking invention related to single crystal semiconductor structures. This invention features a strain compensation layer, an amorphous substrate, a lattice matching layer with multiple single crystal layers, and a single crystal semiconductor layer. The design incorporates a direction control film and a buffer layer, both of which enhance the performance and reliability of semiconductor devices.
Career Highlights
Vladmir has worked with prominent companies in the technology sector, including Samsung Electronics Co., Ltd. and Ibeam Materials, Inc. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge projects in semiconductor manufacturing.
Collaborations
Throughout his career, Vladmir has collaborated with talented professionals such as Junhee Choi and Joohun Han. These partnerships have fostered a creative environment that has led to innovative solutions in the semiconductor industry.
Conclusion
Vladmir Matias is a notable inventor whose work in semiconductor technology has the potential to impact various applications. His patents reflect a commitment to innovation and excellence in his field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile