Vladimir Samara

Title: Vladimir Samara: Innovator in Plasma Etching Technology

Introduction

Vladimir Samara is a notable inventor based in Leuven, Belgium. He has made significant contributions to the field of plasma etching technology, particularly through his innovative methods for monitoring etch uniformity.

Latest Patents

Vladimir Samara holds a patent for a "Method and apparatus for real-time monitoring of plasma etch uniformity." This method provides in-situ monitoring of etch uniformity during plasma etching by detecting interferometry patterns. The technology is applicable to reactors where plasma is created between the surface to be etched and a counter-surface arranged parallel to it. The detection of interference patterns at a specific wavelength is achieved through oscillations of light intensity measured by an optical detector, such as the standard Optical Emission Spectrometry tool of the reactor. When these oscillations are no longer detectable, it indicates that non-uniformity has exceeded a pre-defined limit.

Career Highlights

Throughout his career, Vladimir has worked with prominent organizations, including Imec Vzw and Katholieke Universiteit Leuven, also known as KU Leuven R&D. His work in these institutions has allowed him to advance his research and contribute to the field of plasma technology.

Collaborations

Vladimir has collaborated with various professionals in his field, including his coworker Jean-Francois De Marneffe. Their joint efforts have furthered the development of innovative solutions in plasma etching.

Conclusion

Vladimir Samara's contributions to plasma etching technology through his patented methods demonstrate his expertise and commitment to innovation. His work continues to influence the field and pave the way for future advancements.