Vishwanath Prasad

Title: Innovations of Vishwanath Prasad in Chemical Vapor Deposition

Introduction

Vishwanath Prasad is a notable inventor based in East Setauket, NY (US). He has made significant contributions to the field of chemical vapor deposition, particularly in the production of bulk polysilicon. With a total of three patents to his name, Prasad's work has advanced the technology used in various industrial applications.

Latest Patents

Prasad's latest patents include a "Cold wall reactor and method for chemical vapor deposition of bulk polysilicon" and a "Method and apparatus for chemical vapor deposition of polysilicon." The first patent describes a method and apparatus for producing bulk polysilicon using a chemical vapor deposition process on a removable tube section. This innovative design features a quartz envelope and base plate that form a CVD reactor enclosure, with external radiant heaters providing the necessary process heat. The reaction chamber utilizes a tube section, preferably an EFG silicon tube-section, which is capped and vertically placed on the base plate. The deposition occurs on the inside surface of the chamber tube, leading to a unique accumulation of material.

The second patent outlines a method and apparatus for broad area chemical vapor deposition. This design also employs a quartz envelope and base plate, with external heaters radiating heat through the quartz to achieve the required deposition temperature. A thin wall, edge-defined film fed growth (EFG) silicon tube section serves as the deposition casing. The process allows for a uniform wide surface area deposit on the inside surface of the tube, enhancing the efficiency of polysilicon production.

Career Highlights

Vishwanath Prasad has established himself as a key figure in the field of chemical vapor deposition through his innovative patents. His work at G.T. Equipment Technologies, Inc. has positioned him at the forefront of advancements in polysilicon production technology. His contributions have not only improved existing methods but have also paved the way for future innovations in the industry.

Collaborations

Prasad has collaborated with notable colleagues such as Jonathan A. Talbott and Mohan Chandra. Their combined expertise has further enhanced the development of advanced technologies in chemical vapor deposition.

Conclusion

Vishwanath Prasad's contributions to the field of chemical vapor deposition are significant and impactful. His innovative patents and work at G.T. Equipment Technologies, Inc. demonstrate his commitment to advancing