San Jose, CA, United States of America

Viral Hazari


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 19(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: Innovations by Viral Hazari in Plasma-Enhanced Chemical Vapor Deposition

Introduction

Viral Hazari is an accomplished inventor based in San Jose, California. He has made significant contributions to the field of plasma-enhanced chemical vapor deposition (PECVD) systems. His innovative work focuses on improving the stability and efficiency of these systems, which are crucial for various industrial applications.

Latest Patents

Viral Hazari holds a patent for a "Radio frequency supply circuit for in situ cleaning of plasma-enhanced chemical vapor deposition chamber using NF3 or NF3/He mixture." This invention involves a plasma-enhanced chemical vapor deposition system that includes a balancing inductor in the circuit path between the radio frequency generator and the showerhead used to introduce reactant gases. The balancing inductor effectively reduces the resonant frequency of the circuit, stabilizing the system by self-correcting fluctuations in power delivered to the plasma. This technology is particularly beneficial for addressing plasma stability issues when using NF3 or a mixture of NF3 and inert gases for cleaning PECVD chambers.

Career Highlights

Viral Hazari is associated with Novellus Systems Incorporated, where he has been instrumental in advancing PECVD technologies. His expertise in radio frequency circuits and plasma systems has positioned him as a key figure in the field. With a focus on innovation, he continues to contribute to the development of more efficient and reliable deposition systems.

Collaborations

Viral Hazari has collaborated with notable colleagues, including Stephen E. Hilliker and Sriram Seshagiri. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Viral Hazari's contributions to the field of plasma-enhanced chemical vapor deposition highlight his innovative spirit and dedication to improving industrial processes. His patent and work at Novellus Systems Incorporated demonstrate his commitment to advancing technology in this critical area.

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