Viraj Pandit

Title: Innovations by Viraj Pandit in Process Chamber Shields

Introduction

Viraj Pandit is an accomplished inventor based in San Jose, CA. He has made significant contributions to the field of process chamber technology, particularly in the area of deposition chambers. His innovative work focuses on enhancing the longevity and efficiency of process chamber shields.

Latest Patents

Viraj Pandit holds a patent for "Edge profiling for process chamber shields." This invention addresses the challenges faced in physical vapor deposition (PVD) and chemical vapor deposition (CVD) processes. The patent describes process chamber shields with specially profiled edges that exhibit increased lifetime. By reducing flaking and delamination of materials deposited onto the shields, his invention prolongs shield life and reduces associated costs. The patent outlines various embodiments, including shields with rounded tips, concave portions, and tapered edge portions. These designs better support deposited films, especially those containing compressively stressed materials like metal nitrides.

Career Highlights

Viraj Pandit is currently employed at Novellus Systems Incorporated, where he continues to innovate in the field of semiconductor manufacturing. His work has been instrumental in improving the performance and reliability of deposition processes.

Collaborations

Viraj has collaborated with notable colleagues, including Kedar Hardikar and Yajie Liu, to advance research and development in process chamber technologies.

Conclusion

Viraj Pandit's contributions to the field of process chamber shields demonstrate his commitment to innovation and excellence. His patented designs not only enhance the performance of deposition chambers but also contribute to cost savings in semiconductor manufacturing.