Location History:
- New Delhi, IN (2018 - 2022)
- Sunder Vihar, IN (2022)
Company Filing History:
Years Active: 2018-2022
Title: Innovations of Vipul Aggarwal
Introduction
Vipul Aggarwal is a notable inventor based in New Delhi, India. He has made significant contributions to the fields of garment technology and digital imaging. With a total of eight patents to his name, Aggarwal's work showcases his innovative spirit and technical expertise.
Latest Patents
One of his latest patents is focused on pattern filling in garment pieces. This invention involves a pattern filling system that represents a first garment piece as a first curve and a second garment piece as a second curve. The system determines a relationship between the two garment pieces by comparing the first and second curves. It generates a visually pleasing fill pattern for both garment pieces based on the determined relationship. Another significant patent is for automatic artifact removal in a digital image. This invention describes techniques and systems for removing artifacts from digital images. A segmentation map is generated to describe the magnitude of difference among pixels in the image. Contours are created to describe the boundaries of objects in the segmentation map. These contours are filtered using two-dimensional and three-dimensional cues to identify those corresponding to artifacts. For each contour, an object mask and a sampling mask are generated, which are then utilized in a content filling operation to produce a corrected digital image free of artifacts.
Career Highlights
Aggarwal has worked with prominent companies such as Adobe Inc. and Adobe Systems Inc. His experience in these organizations has allowed him to refine his skills and contribute to various innovative projects.
Collaborations
Some of his notable coworkers include Naveen Prakash Goel and Lakshay Kumar. Their collaboration has likely fostered a creative environment that encourages innovation and the development of new ideas.
Conclusion
Vipul Aggarwal's contributions to technology through his patents reflect his dedication to innovation. His work in garment technology and digital imaging continues to influence these fields positively.