Vincent Ah-Leung

Title: Vincent Ah-Leung: Innovator in Dielectric Layer Etching

Introduction

Vincent Ah-Leung is a notable inventor based in Grenoble, France. He has made significant contributions to the field of semiconductor technology, particularly in the etching of dielectric layers. His innovative methods have the potential to enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Vincent Ah-Leung holds a patent for a "Method for etching a three-dimensional dielectric layer." This patent describes a method that involves a series of sequences, including a main oxidation step to form an oxide film and a main anisotropic etching process. The method is designed to etch a dielectric layer that partially covers a structure made of semi-conductive material, ensuring precision and control throughout the etching process.

Career Highlights

Throughout his career, Vincent has worked with prestigious organizations, including the Commissariat à l'Énergie Atomique et aux Énergies Alternatives. His work in these institutions has allowed him to develop and refine his innovative techniques in semiconductor processing.

Collaborations

Vincent has collaborated with esteemed colleagues such as Nicolas Posseme and Olivier Pollet. These partnerships have contributed to the advancement of his research and the successful implementation of his patented methods.

Conclusion

Vincent Ah-Leung is a distinguished inventor whose work in dielectric layer etching has made a significant impact on semiconductor technology. His innovative methods and collaborations continue to influence the field, paving the way for future advancements.