Company Filing History:
Years Active: 1999-2001
Title: Innovations by Venus Noorai in Semiconductor Cleaning Technologies
Introduction
Venus Noorai is an accomplished inventor based in San Jose, CA, known for his contributions to semiconductor cleaning technologies. With a total of 2 patents, Noorai has developed innovative methods that enhance the efficiency of cleaning semiconductor substrates, particularly silicon wafers.
Latest Patents
Noorai's latest patents focus on an apparatus for cleaning semiconductor substrates. The first patent describes a cleaning method and apparatus that utilizes very dilute Standard Clean 1 (SC1) for cleaning semiconductor substrates. This method involves delivering SC1 to the core of a brush, where the solution is absorbed and then applied to the substrate. This delivery system ensures that chemical solutions are applied uniformly, significantly reducing the volume of chemicals used during the scrubbing process. The invention also converts substrate surfaces from a hydrophobic state to a hydrophilic state, which is essential for effectively removing surface contaminants through chemical mechanical brush cleaning.
The second patent mirrors the first, emphasizing the same innovative cleaning method and apparatus using SC1. This consistency in his patents highlights Noorai's commitment to improving semiconductor cleaning processes.
Career Highlights
Throughout his career, Venus Noorai has worked with notable companies in the semiconductor industry, including Ontrak Systems, Inc. and Lam Research Corporation. His experience in these organizations has contributed to his expertise in developing advanced cleaning technologies for semiconductor substrates.
Collaborations
Noorai has collaborated with several professionals in his field, including Diane J Hymes and Mikhail Ravkin. These collaborations have likely enriched his work and contributed to the development of his innovative cleaning methods.
Conclusion
Venus Noorai's contributions to semiconductor cleaning technologies through his patents demonstrate his innovative spirit and dedication to improving industry standards. His work not only enhances the efficiency of cleaning processes but also plays a crucial role in advancing semiconductor manufacturing.