Venkata Dora Chowdary Kakarla

Title: Venkata Dora Chowdary Kakarla: Innovator in Physical Vapor Deposition Technology

Introduction

Venkata Dora Chowdary Kakarla is a notable inventor based in San Jose, CA (US). He has made significant contributions to the field of physical vapor deposition (PVD) technology. His innovative approach has led to the development of a unique system that enhances the efficiency of material deposition processes.

Latest Patents

Kakarla holds a patent for a "Physical vapor deposition system using rotating pallet with X and Y positioning." This invention features a circular PVD chamber equipped with multiple sputtering targets mounted on the top wall. The system includes a pallet that rotates about its center axis and can shift in an XY direction, allowing precise positioning of workpieces beneath the sputtering targets. This design minimizes material waste by utilizing a scanning magnet that operates only above the necessary portions of the workpiece. Additionally, a cooling backside gas volume is created to support small workpieces effectively.

Career Highlights

Kakarla is currently employed at Tango Systems, Inc., where he continues to innovate in the field of PVD technology. His work has garnered attention for its potential to improve manufacturing processes in various industries.

Collaborations

Kakarla collaborates with talented individuals such as Ravi Mullapudi and Srikanth Dasaradhi, contributing to a dynamic work environment that fosters innovation.

Conclusion

Venkata Dora Chowdary Kakarla's contributions to physical vapor deposition technology exemplify the impact of innovative thinking in engineering. His patent reflects a commitment to enhancing manufacturing efficiency and reducing waste.