Company Filing History:
3 out of 3 
1 out of 2,019 
Years Active: 1996
Title: The Innovations of Ven L Lee
Introduction
Ven L Lee is a notable inventor based in Los Altos Hills, California. He has made significant contributions to the field of gate array devices, holding a total of 3 patents. His work focuses on methodologies that enhance the design and functionality of integrated circuits.
Latest Patents
One of his latest patents is titled "Process Independent Design for Gate Array Devices." This invention presents a unique methodology for developing gate array cells and ASIC libraries that require no new simulations or place and route adjustments when porting device designs across different vendors' process technologies. The methodology utilizes minimum design rules from various vendors without the need to reroute the physical database, ensuring equal functionality and timing characteristics across multiple sources.
Another significant patent is "Multiple Source Equalization Design for Gate Arrays and Embedded Arrays." This invention achieves matched performance of alternate sourced ASICs while minimizing die size from each fabrication facility. It involves adjusting the width of electrical interconnects and transistor channel widths to compensate for capacitance differences in interconnect paths. Additionally, capacitance can be added to transistor gates to decrease speed when manufactured by faster processes.
Career Highlights
Ven L Lee has worked with several prominent companies, including Nsoft Systems, Inc. and Compaq Computer Corporation. His experience in these organizations has contributed to his expertise in the field of integrated circuit design.
Collaborations
Throughout his career, Ven L Lee has collaborated with notable individuals such as William M Dawson and Hemraj K Hingarh. These collaborations have likely enriched his work and contributed to his innovative patents.
Conclusion
Ven L Lee's contributions to the field of gate array devices and integrated circuit design are noteworthy. His innovative methodologies and patents reflect his expertise and commitment to advancing technology.