Barlett, IL, United States of America

Vadim V Krongauz


Average Co-Inventor Count = 3.0

ph-index = 4

Forward Citations = 108(Granted Patents)


Company Filing History:


Years Active: 2001-2006

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5 patents (USPTO):Explore Patents

Title: Vadim V Krongauz: Innovator in Dielectric Coating Technologies

Introduction

Vadim V Krongauz is a notable inventor based in Bartlett, IL (US), recognized for his contributions to dielectric coating technologies. With a total of 5 patents to his name, he has made significant advancements in the field of radiation-curable coating compositions.

Latest Patents

Krongauz's latest patents include innovative dielectric, radiation-curable coating compositions. One of his inventions involves a metal conductor coated with a cured layer ranging from about 2.5 μm to about 500 μm in thickness. This coating exhibits a dielectric dissipation factor of less than about 0.05 at 60 Hz and 24°C. The formulation includes an acrylate functional urethane oligomer with a hydrocarbon backbone, mono- or polyfunctional diluents, and optionally, light-sensitive radical generating compounds. Another significant patent focuses on a UV-curable acrylate-thiol-ene insulating coating composition for electrical conductors, which also maintains a dielectric dissipation factor below 0.05.

Career Highlights

Vadim V Krongauz is currently associated with DSM N.V., where he continues to develop innovative coating solutions. His work has been instrumental in enhancing the performance and reliability of electrical conductors through advanced coating technologies.

Collaborations

Krongauz has collaborated with notable professionals in his field, including Michael G Sullivan and Stephen C Lapin. These collaborations have contributed to the successful development of his patented technologies.

Conclusion

Vadim V Krongauz stands out as a key figure in the innovation of dielectric coating technologies, with a focus on enhancing the performance of electrical conductors. His contributions through patents and collaborations reflect his commitment to advancing the field.

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