Hyderabad Telangana, India

Uma Maheswara R Chandolu

USPTO Granted Patents = 7 

Average Co-Inventor Count = 3.1

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2017-2019

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7 patents (USPTO):Explore Patents

Title: Celebrating the Innovations of Uma Maheswara R. Chandolu

Introduction: Uma Maheswara R. Chandolu, based in Hyderabad, Telangana, India, is a prominent inventor known for her innovative contributions to technology. With a remarkable portfolio of seven patents, she has made significant strides in areas involving computing systems and resource management.

Latest Patents: Among her latest patents is the "Stack Detail Recovery," a computer-implemented method designed for pageable operating system environments that do not store all kernel pages in memory. This method identifies one or more stack frame pages and involves storing them in a logical dump volume, which is accessible upon system reboot. Additionally, she holds a patent for "Rearrangement Management for a Shared Pool of Configurable Computing Resources." This invention relates to managing rearrangement for a shared resource pool, ensuring effective data handling and system efficiency.

Career Highlights: Uma's career at the International Business Machines Corporation (IBM) showcases her commitment to advancing technology. Her expertise in computer systems and resource management has led to innovative solutions that enhance operational performance and reliability.

Collaborations: Throughout her career, Uma has collaborated with some esteemed professionals, including Amit Agarwal and Faraz Ahmad. These collaborations have further enriched her work, resulting in solutions that push the boundaries of technology.

Conclusion: Uma Maheswara R. Chandolu exemplifies the spirit of innovation in the tech industry. Through her patents and collaborative efforts, she continues to contribute valuable advancements that influence modern computing systems. Her work not only showcases her ingenuity but also serves as an inspiration for future inventors in the field.

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