Dresden, Germany

Ulrich Scheler


Average Co-Inventor Count = 2.7

ph-index = 3

Forward Citations = 45(Granted Patents)


Location History:

  • Munich, DE (1995)
  • Munchen, DE (1998)
  • Dresden, DE (2003 - 2004)

Company Filing History:


Years Active: 1995-2004

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5 patents (USPTO):Explore Patents

Title: Ulrich Scheler: Innovator in Semiconductor Lithography

Introduction

Ulrich Scheler is a prominent inventor based in Dresden, Germany. He has made significant contributions to the field of semiconductor lithography, holding a total of 5 patents. His innovative methods have advanced the accuracy and efficiency of photomask imaging and optical exposure units.

Latest Patents

One of his latest patents is a method for experimentally verifying imaging errors in photomasks. This method enables the determination of imaging errors for the lithographic structuring of semiconductors. A latent image of the mask is produced in a photoactivatable layer through exposure. After heat treatment to increase contrast and development of the exposed resist, the resist is treated with an amplification agent. This agent diffuses into the exposed parts of the photoresist, reacting with its groups and increasing the layer thickness in those areas. A topographical image of the photoresist surface, created by scanning electron microscopy, reveals imaging errors through protuberances outside the mask image. This method allows for testing the mask layout under production conditions, facilitating the adjustment and checking of all components of the phototransfer system used in microchip production.

Another significant patent by Scheler focuses on verifying imaging errors in optical exposure units. Similar to his previous method, a latent image of a mask is produced in a photoactivatable layer using the optical exposure unit being tested. After heat treatment and development, the resist is treated with an amplification agent, leading to an increase in layer thickness in the exposed areas. The resulting topographical image indicates imaging errors, allowing for the testing of optical exposure units under production conditions and aiding in the adjustment of exposure system components.

Career Highlights

Ulrich Scheler has worked with notable companies in the semiconductor industry, including Infineon Technologies AG and Siemens Aktiengesellschaft. His experience in these organizations has contributed to his expertise in lithographic technologies.

Collaborations

Throughout his career, Scheler has collaborated with esteemed colleagues such as Michael Sebald and Günther Czech. Their joint efforts have furthered advancements in semiconductor technology.

Conclusion

Ulrich Scheler's innovative work in semiconductor lithography has led to significant advancements in the field. His patents and collaborations reflect his commitment to improving the accuracy and efficiency of semiconductor manufacturing processes.

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