Location History:
- Munich, DE (1977 - 1979)
- Neufahrn, DE (1981)
Company Filing History:
Years Active: 1977-1981
Title: The Innovations of Ulrich Rucha
Introduction
Ulrich Rucha is a prominent inventor based in Munich, Germany. He has made significant contributions to the field of semiconductor technology, holding a total of six patents. His work focuses on methods for the deposition of silicon, which is crucial for the development of various electronic devices.
Latest Patents
Rucha's latest patents include a method of deposition of silicon in fine crystalline form. This innovative technique involves depositing silicon upon a substrate from a silicon-containing reaction gas. The process is characterized by setting the deposition rate-determining temperature of the substrate at a lower than optimal temperature during the initial phase. This is followed by raising the temperature to the optimal level while maintaining other parameters. Another notable patent is the process for depositing elemental silicon semiconductor material from a reactive gas stream. This method ensures that the silicon deposition rate remains constant throughout the deposition process.
Career Highlights
Ulrich Rucha is currently associated with Siemens Aktiengesellschaft, a leading global technology company. His work at Siemens has allowed him to push the boundaries of semiconductor technology and contribute to advancements in the field. His innovative approaches have garnered attention and respect within the industry.
Collaborations
Rucha has collaborated with notable colleagues such as Wolfgang Dietze and Konrad Reuschel. These partnerships have facilitated the exchange of ideas and have contributed to the success of various projects.
Conclusion
Ulrich Rucha's contributions to semiconductor technology through his innovative patents and collaborations highlight his importance in the field. His work continues to influence advancements in electronic devices and materials science.