Company Filing History:
Years Active: 1984
Title: Ulrich Rendelmann: Innovator in Photographic Substrate Technology
Introduction
Ulrich Rendelmann is a notable inventor based in Leverkusen, Germany. He has made significant contributions to the field of photographic technology, particularly in the pretreatment of photographic substrates. His innovative approach has led to advancements that enhance the quality and durability of photographic coatings.
Latest Patents
Rendelmann holds a patent for a process aimed at improving the adhesion of photographic emulsions to substrates. The patent, titled "Process for the pretreatment of photographic substrates," describes a method where corona discharge is performed under reduced pressure. This technique not only enhances adhesion and wettability but also minimizes residual charges on the substrate, ensuring long-lasting effects.
Career Highlights
Throughout his career, Ulrich Rendelmann has been associated with Agfa-Gevaert AG, a leading company in imaging technology. His work has been instrumental in developing processes that improve the performance of photographic materials. Rendelmann's expertise in this niche area has positioned him as a key figure in the industry.
Collaborations
Rendelmann has collaborated with notable colleagues such as Friedrich Dolezalek and Gunther Koepke. These partnerships have fostered an environment of innovation and have contributed to the advancement of photographic technologies.
Conclusion
Ulrich Rendelmann's contributions to the field of photographic substrate technology exemplify the impact of innovative thinking in enhancing product performance. His patent and work at Agfa-Gevaert AG reflect a commitment to excellence in imaging technology.