Company Filing History:
Years Active: 1990-2003
Title: Innovations of Ulrich Patz: A Pioneer in Vacuum Technology
Introduction
Ulrich Patz is a notable inventor based in Linsengericht, Germany, recognized for his contributions to vacuum technology. With a total of seven patents to his name, he has made significant advancements in the field of thin layer deposition and substrate cleaning processes. His work has had a profound impact on various industries that rely on precise material application and surface treatment.
Latest Patents
One of Patz's latest innovations is a vacuum treatment apparatus designed for the deposition of thin layers on three-dimensional substrates. This apparatus features multiple treatment and airlock stations within a stationary circular cylindrical vacuum chamber. The design allows for efficient substrate handling and treatment, utilizing a rotatably arranged inner wall cylinder that facilitates the loading and unloading of substrates. Another significant patent involves a process for cleaning substrates using a barrier discharge device. This device operates within a vacuum chamber and employs electrodes and a dielectric to generate plasma particles and UV radiation, enabling effective cleaning processes that are independent of pressure.
Career Highlights
Throughout his career, Ulrich Patz has worked with prominent organizations such as Leybold Aktiengesellschaft and Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. His experience in these companies has allowed him to refine his expertise in vacuum technology and contribute to groundbreaking innovations.
Collaborations
Patz has collaborated with notable colleagues, including Michael Scherer and Rudolf Latz, who have contributed to his research and development efforts. Their combined expertise has further advanced the field of vacuum technology.
Conclusion
Ulrich Patz's contributions to vacuum technology through his innovative patents and collaborations have established him as a key figure in the industry. His work continues to influence advancements in material processing and substrate treatment.