Location History:
- Chiba, JP (1987 - 1994)
- Tokyo, JP (1997 - 2014)
- Tokushima, JP (2014)
Company Filing History:
Years Active: 1987-2014
Title: Ujihiro Nishiike: Innovator in Thermoelectric Semiconductor Technology
Introduction
Ujihiro Nishiike is a prominent inventor based in Chiba, Japan, known for his significant contributions to thermoelectric semiconductor technology. With a total of 10 patents to his name, Nishiike has made remarkable advancements in the field, particularly in the development of materials and methods that enhance thermoelectric performance.
Latest Patents
Nishiike's latest patents include innovations such as thermoelectric semiconductor material, thermoelectric semiconductor elements using this material, and thermoelectric modules that utilize these elements. His patented manufacturing method involves preparing a metal mixture with an excess amount of tellurium (Te) added to a bismuth-antimony (Bi-Sb) based composition. After melting this mixture, the molten metal is solidified on a cooling roll, ensuring a thickness of no less than 30 micrometers. This process results in plate-shaped raw thermoelectric semiconductor materials, where tellurium-rich phases are microscopically dispersed within complex compound semiconductor phases. The crystalline orientation is improved, leading to an increased thermoelectric figure-of-merit.
Career Highlights
Throughout his career, Nishiike has worked with notable companies, including Kawasaki Steel Corporation and IHI Corporation. His experience in these organizations has allowed him to refine his expertise in thermoelectric materials and their applications.
Collaborations
Nishiike has collaborated with esteemed colleagues such as Michiro Komatsubara and Yoshiaki Iida, contributing to the advancement of thermoelectric technologies through shared knowledge and innovative ideas.
Conclusion
Ujihiro Nishiike's work in thermoelectric semiconductor technology showcases his dedication to innovation and excellence. His patents and career achievements reflect his significant impact on the field, paving the way for future advancements in thermoelectric materials and applications.