Company Filing History:
Years Active: 2019
Title: Udo Goetschkes: Innovator in Semiconductor Technology
Introduction
Udo Goetschkes is a prominent inventor based in Dresden, Germany. He has made significant contributions to the field of semiconductor technology, particularly through his innovative methods and techniques. His work has been recognized in the industry, showcasing his expertise and dedication to advancing technology.
Latest Patents
Udo Goetschkes holds a patent for a "Method for producing a self-aligning masking layer." This patent describes a method that includes forming a buried electrically charged region at a predefined position in a first layer. The buried electrically charged region generates an electric field with a lateral inhomogeneous field distribution above the first layer. The method further involves forming a second layer above the first layer, utilizing the field distribution to ensure that the structure of the second layer correlates with the position of the buried electrically charged region. This innovative approach enhances the precision and efficiency of semiconductor manufacturing processes.
Career Highlights
Throughout his career, Udo Goetschkes has been associated with Infineon Technologies AG, a leading company in the semiconductor industry. His work at Infineon has allowed him to collaborate with other talented professionals and contribute to groundbreaking advancements in technology. His dedication to research and development has positioned him as a key figure in his field.
Collaborations
Udo Goetschkes has worked alongside notable colleagues, including Heiko Aßmann and Felix Braun. Their collaborative efforts have fostered an environment of innovation and creativity, leading to the development of new technologies and methodologies in semiconductor production.
Conclusion
Udo Goetschkes is a distinguished inventor whose contributions to semiconductor technology have made a lasting impact. His innovative methods and collaborative spirit continue to drive advancements in the industry.