Shizuoka, Japan

Tsutomu Yoshimura

USPTO Granted Patents = 2 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2023

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2 patents (USPTO):Explore Patents

Title: Tsutomu Yoshimura: Innovator in Radiation-Sensitive Resin Technology

Introduction

Tsutomu Yoshimura is a distinguished inventor hailing from Shizuoka, Japan. Known for his contributions to the field of radiation-sensitive resin compositions, he has successfully registered two patents that advance technology in electronic device manufacturing.

Latest Patents

His latest patents focus on the development of an actinic ray-sensitive or radiation-sensitive resin composition. These inventions are pivotal in creating resist films, pattern-forming methods, and methods for manufacturing electronic devices. The innovations provided are essential for enhancing the functionality and efficiency of electronic devices, showcasing Yoshimura’s commitment to pushing technological boundaries.

Career Highlights

Tsutomu Yoshimura is currently employed by Fujifilm Corporation, a prominent player in the imaging and information technology sectors. His work there has solidified his reputation as an innovative thinker and problem solver in his field.

Collaborations

Throughout his career, Yoshimura has collaborated with notable coworkers, including Yasunori Yonekuta and Naoya Hatakeyama. Their combined expertise has fostered a dynamic environment conducive to innovation and has led to significant advancements in their projects.

Conclusion

Tsutomu Yoshimura stands out as a remarkable inventor with a focus on advancements in radiation-sensitive resin technology. His ongoing contributions at Fujifilm Corporation continue to influence the electronic device industry, making him an important figure in contemporary invention and innovation.

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