Company Filing History:
Years Active: 1999
Title: Tsutomu Nakanishi: Innovator in Spin Polarized Electron Technology
Introduction
Tsutomu Nakanishi is a prominent inventor based in Aichi, Japan. He is known for his significant contributions to the field of semiconductor technology, particularly in the development of spin polarized electron sources.
Latest Patents
Nakanishi holds a patent for a "Spin polarized electron semiconductor source and apparatus utilizing the." This invention involves a substrate with a block layer that has an electron affinity smaller than that of the substrate. It features a p-type strained superlattice structure that operates as a generation region of spin polarized electrons. The superlattice structure is formed of a multilayer where a strained well layer and a barrier layer are alternately laminated multiple times. The strained well layer has a lattice constant greater than that of the substrate and a thickness equal to or less than a wavelength of the electron wave. The barrier layer has a conduction band lower in energy than that of the strained well layer, allowing electrons to transmit based on the tunnel effect. Additionally, the valence band of the superlattice structure experiences a widening of the energy difference between the bands for heavy holes and light holes due to compressive stress in the strained well layer.
Career Highlights
Throughout his career, Nakanishi has worked with notable organizations such as NEC Corporation and the Japan Science and Technology Agency. His work has significantly impacted the semiconductor industry, particularly in the area of spintronics.
Collaborations
Nakanishi has collaborated with esteemed colleagues, including Toshio Baba and Masashi Mizuta. Their joint efforts have contributed to advancements in semiconductor technologies.
Conclusion
Tsutomu Nakanishi's innovative work in spin polarized electron technology showcases his expertise and dedication to advancing semiconductor science. His contributions continue to influence the field and inspire future innovations.