Hachioji, Japan

Tsuneo Okubo


Average Co-Inventor Count = 3.6

ph-index = 4

Forward Citations = 41(Granted Patents)


Location History:

  • Hachioji, JP (1981 - 1984)
  • Tokyo, JP (1984)

Company Filing History:


Years Active: 1981-1984

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4 patents (USPTO):Explore Patents

Title: Tsuneo Okubo: Innovator in Electron Beam Technology

Introduction

Tsuneo Okubo is a prominent inventor based in Hachioji, Japan. He has made significant contributions to the field of electron beam technology, holding a total of 4 patents. His work focuses on enhancing the precision and efficiency of electron beam exposure methods.

Latest Patents

One of his latest patents is an exposure method with an electron beam exposure apparatus. This invention involves emitting an electron beam onto a substrate, such as a silicon wafer coated with an electron-beam sensitive resist. The method allows for direct pattern formation or writing. The substrate is divided into blocks, each containing multiple chips. Marks are provided on each block, and the writing exposure positions of the chips are modified based on detection results. This innovation enables efficient writing exposure with high accuracy.

Another notable patent is the method and apparatus of deflection calibration for a charged particle beam exposure apparatus. This invention features both electromagnetic and electrostatic deflectors for deflecting a charged particle beam. The calibration operation is performed using a fiducial mark positioned in a predetermined location. The beam is deflected by the calibrated electromagnetic deflector, and the electrostatic deflector detects the location of the fiducial mark. This method allows for quick calibration without degrading the precision of lithography due to heat generated by stage movement.

Career Highlights

Throughout his career, Tsuneo Okubo has worked with notable companies, including Nippon Telegraph and Telephone Public Corporation and Hitachi, Ltd. His experience in these organizations has contributed to his expertise in electron beam technology and innovation.

Collaborations

He has collaborated with esteemed colleagues such as Susumu Ozasa and Norio Saitou. Their joint efforts have further advanced the field of electron beam exposure methods.

Conclusion

Tsuneo Okubo's contributions to electron beam technology through his innovative patents have significantly impacted the industry. His work continues to inspire advancements in precision and efficiency in electron beam applications.

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