Tsukasa Yoneyama is a notable inventor based in Sendai-shi, Miyagi, Japan. He has made significant contributions to the field of plasma processing, holding two patents that showcase his innovative approach to technology.

Latest Patents

Yoneyama's latest patents include a plasma processing system and an electromagnetic radiator using a leaky NRD waveguide. The plasma processing system features a vacuum chamber designed to accommodate a substrate and generate plasma. It includes an antenna that emits high-frequency power, which processes the substrate's surface through plasma interaction. The design incorporates a disk-shaped conductor plate and a coaxial waveguide with a short-circuit 3 dB directional coupler, ensuring efficient power transmission and high-density plasma generation. This advancement allows for the processing of large-area substrates. His second patent, the electromagnetic radiator, utilizes dielectric strips placed between conductor plates. When high-frequency power is applied, electromagnetic waves are radiated from cutouts in the dielectric strips, exciting radiation elements in the conductor plates.

Career Highlights

Throughout his career, Yoneyama has worked with various companies, including Yagi Antenna Co., Ltd. His work has significantly impacted the development of plasma processing technologies, enhancing their efficiency and effectiveness.

Collaborations

Yoneyama has collaborated with notable individuals in his field, including Akira Takahashi and Atsushi Kaise. Their combined expertise has contributed to the advancement of innovative technologies in plasma processing.

Conclusion

Tsukasa Yoneyama's contributions to plasma processing technology through his patents demonstrate his innovative spirit and dedication to advancing the field. His work continues to influence the industry and inspire future innovations.

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