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Years Active: 2022-2025
Title: Tsubasa Okamoto: Innovator in Plasma Processing Technology
Introduction
Tsubasa Okamoto is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of four patents. His work focuses on enhancing the accuracy and efficiency of semiconductor manufacturing processes.
Latest Patents
Okamoto's latest patents include a plasma processing apparatus and a plasma processing method. These innovations aim to detect and process the thickness of the processing target film with high accuracy, even when the fine shape of the semiconductor wafer surface varies. The method involves detecting the state of a processing target film within a vacuum processing chamber, monitoring light emission from the plasma, and obtaining differential waveform data. By storing multiple pieces of differential waveform pattern data, the method calculates an estimated value of the film thickness and determines the endpoint of processing using the plasma based on this estimation.
Career Highlights
Tsubasa Okamoto is currently employed at Hitachi High-Tech Corporation, where he continues to develop advanced technologies in plasma processing. His expertise has positioned him as a key player in the semiconductor industry, contributing to innovations that improve manufacturing processes.
Collaborations
Okamoto has collaborated with notable colleagues, including Soichiro Eto and Tatehito Usui. Their combined efforts have led to advancements in plasma processing technologies, further enhancing the capabilities of semiconductor manufacturing.
Conclusion
Tsubasa Okamoto's work in plasma processing technology exemplifies the impact of innovation in the semiconductor industry. His patents and collaborations reflect a commitment to advancing manufacturing processes and improving accuracy in film thickness detection.