Company Filing History:
Years Active: 1991
Title: Trice W Haas: Innovator in Thin Solid Lubricious Films
Introduction
Trice W Haas is a notable inventor based in Kettering, OH (US). He has made significant contributions to the field of materials science, particularly in the development of thin solid lubricious films. His innovative work has led to advancements in the application of solid lubricants, which are essential in various industrial processes.
Latest Patents
Trice W Haas holds a patent for a "Method for forming thin solid lubricious films and film articles made." This patent focuses on the growth of thin films of solid lubricious metal chalcogenides, such as MoS₂, on stainless steel substrates through pulsed laser evaporation (P.L.E.). The research indicates that X-ray photoelectron spectroscopy of PLE deposited MoS₂ films grown at substrate temperatures up to 300°C maintains the same stoichiometry as bulk MoS₂. Furthermore, films grown at 450°C are sulfur-rich, exhibiting a granular structure without the dendritic formations typically seen in sputter-deposited films. The coefficients of friction for these films were measured in laboratory air, ranging from 0.09 to 0.25, with most values falling between 0.16 and 0.20, making them suitable for use as solid lubricants.
Career Highlights
Trice W Haas is affiliated with the University of Dayton, where he continues to engage in research and development in his field. His work has not only contributed to academic knowledge but has also practical implications in various industries that require efficient lubrication solutions.
Collaborations
Trice has collaborated with notable colleagues, including Michael S Donley and Paul T Murray. These partnerships have fostered a collaborative environment that enhances innovation and research output.
Conclusion
Trice W Haas is a distinguished inventor whose work on thin solid lubricious films has paved the way for advancements in lubrication technology. His contributions are vital for industries seeking effective solutions for friction reduction.