Location History:
- Minami-Ashigara, JP (2012)
- Kanagawa, JP (2019)
Company Filing History:
Years Active: 2012-2019
Title: Toshiya Mita: Innovator in Antifogging Technology
Introduction
Toshiya Mita is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of materials science, particularly in the development of antifogging films and coating methods. With a total of 2 patents, Mita's work has garnered attention in both academic and industrial circles.
Latest Patents
Mita's latest patents include an innovative antifogging film and a bar coater with a unique coating method. The antifogging film features a film base made of cellulose triacetate and a saponified layer that enhances its performance. This film is designed to maintain a contact angle of 20° or less within 15 seconds of water exposure, ensuring clarity and functionality. His second patent, the bar coater, includes a sophisticated design that allows for precise application of coating liquids, minimizing distortion at the dynamic contact line between the liquid and the atmosphere.
Career Highlights
Toshiya Mita is currently employed at Fujifilm Corporation, where he continues to innovate and develop new technologies. His work has not only advanced the capabilities of antifogging films but has also improved coating methods used in various applications. Mita's expertise in materials science has positioned him as a key player in his field.
Collaborations
Mita collaborates with talented colleagues such as Hiroki Yokoyama and Nobuo Hamamoto. Together, they contribute to the ongoing research and development efforts at Fujifilm Corporation, pushing the boundaries of technology in their respective areas.
Conclusion
Toshiya Mita's contributions to antifogging technology and coating methods highlight his innovative spirit and dedication to advancing materials science. His patents reflect a commitment to improving product performance and functionality in various applications.