Company Filing History:
Years Active: 2004
Title: Innovations of Toshio Sawano in Semiconductor Manufacturing
Introduction
Toshio Sawano is a notable inventor based in Kasugai, Japan. He has made significant contributions to the field of semiconductor manufacturing. His innovative approach has led to the development of a unique patent that enhances the efficiency of semiconductor device production.
Latest Patents
Toshio Sawano holds a patent for a semiconductor device manufacture method that utilizes an exposure process with a small exposure amount. The patent describes a method where first and second areas are defined on a substrate. A partial area of a resist film formed on the substrate's surface is exposed to light of a first intensity, corresponding to the first area. The light, having transmitted through a pattern of a first reticle, is then transferred. Additionally, the resist film above the second area is exposed to light of a second intensity, which is weaker than the first intensity. The resist film above both areas is further exposed to light of a third intensity, also weaker than the first intensity, transmitted through a pattern of a second reticle. The exposed resist film is then developed, showcasing an innovative approach to semiconductor manufacturing.
Career Highlights
Toshio Sawano is currently employed at Fujitsu Corporation, where he continues to work on advancements in semiconductor technology. His expertise and innovative mindset have positioned him as a valuable asset in the field.
Collaborations
Toshio collaborates with Takayoshi Minami, contributing to the development of cutting-edge technologies in semiconductor manufacturing.
Conclusion
Toshio Sawano's contributions to semiconductor manufacturing through his innovative patent demonstrate his commitment to advancing technology in this critical field. His work continues to influence the industry positively.