Company Filing History:
Years Active: 1992-1993
Title: Toshio Okawa: Innovator in Silicon Crystal Technology
Introduction
Toshio Okawa is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of silicon crystal technology, holding a total of 3 patents. His work focuses on methods and apparatuses that enhance the manufacturing processes of silicon single crystals.
Latest Patents
Okawa's latest patents include innovative methods for controlling and measuring the diameter of silicon single crystals. One of his notable patents is a method and apparatus for controlling the diameter of a silicon single crystal. This invention involves a sophisticated process where the diameter of the pulled single crystal is measured optically, and deviations from a desired diameter are calculated to adjust the pull rate accordingly. Another significant patent is a method for measuring the diameter of a silicon single crystal, which utilizes optical means to sample luminance distribution and process the data to obtain accurate diameter measurements.
Career Highlights
Toshio Okawa is associated with NKK Corporation, where he applies his expertise in silicon crystal technology. His innovative approaches have contributed to advancements in the manufacturing processes of silicon single crystals, which are essential in various technological applications.
Collaborations
Okawa has collaborated with notable colleagues, including Akihiro Kawashima and Tatsuo Sato. Their combined efforts in research and development have furthered the understanding and capabilities in silicon crystal technology.
Conclusion
Toshio Okawa's contributions to the field of silicon crystal technology through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the industry positively, paving the way for future innovations in silicon manufacturing processes.