Mobara, Japan

Toshio Kaneshige

USPTO Granted Patents = 1 

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 1999

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Innovator Toshio Kaneshige and His Field Emission Device Patent

Introduction: Toshio Kaneshige, an accomplished inventor based in Mobara, Japan, has made significant contributions to the field of electronics. With one patent credited to his name, he has demonstrated his expertise in developing innovative solutions that play a crucial role in technological advancement.

Latest Patents: Kaneshige's notable patent is for a field emission device and the method for manufacturing it. This innovative device is designed to facilitate manufacturing processes, providing a cathode substrate formed on the same plane with gate terminals and a cathode electrode. Each of these elements has an end that acts as a cathode terminal, with an insulating layer arranged over it. Furthermore, the insulating layer is enhanced with gate lines that connect to the gate terminals, utilizing a conductive film deposited in contact holes formed during the gate electrode creation.

Career Highlights: Currently, Toshio Kaneshige works at Futaba Denshi Kogyo Co., Ltd., a notable company in the electronics sector. His expertise in the design and manufacturing of field emission devices reflects the innovative spirit that drives the organization forward.

Collaborations: Throughout his career, Kaneshige has had the opportunity to collaborate with talented colleagues such as Norio Nishimura and Masateru Taniguchi. Their collective efforts and shared insights have fostered an environment of innovation, leading to advancements in the technologies they work with.

Conclusion: Toshio Kaneshige's contributions to the field of electronics through his patent for a field emission device exemplify the impact that dedicated inventors can have on technology. As he continues to innovate at Futaba Denshi Kogyo Co., Ltd., his work will undoubtedly inspire future developments in the industry.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…