Toshimitsu Yanagihara

Title: Toshimitsu Yanagihara: Innovator in Positive Resist Patterns

Introduction

Toshimitsu Yanagihara is a notable inventor based in Shinnanyo, Japan. He has made significant contributions to the field of materials science, particularly in the development of positive resist patterns. His innovative work has led to advancements in various applications, showcasing his expertise and dedication to the field.

Latest Patents

Yanagihara holds a patent for positive resist patterns prepared using a derivative of polyacrylic acid esters containing halogen. The patent details a resist material characterized by a specific general formula, where A represents a structural unit derived from monomers with a copolymerable double bond, and X can be either a halogen atom or a methyl group. The parameters m and n are defined within certain ranges, allowing for a versatile application of the resist material. This invention is crucial for enhancing the performance and efficiency of resist patterns in various technological applications.

Career Highlights

Throughout his career, Toshimitsu Yanagihara has been associated with Tosoh Corporation, a leading company in the chemical industry. His work at Tosoh has allowed him to collaborate with other talented professionals and contribute to groundbreaking research and development projects. His dedication to innovation has earned him recognition in the field.

Collaborations

Yanagihara has worked alongside esteemed colleagues such as Yoshitaka Tsutsumi and Toru Seita. These collaborations have fostered a creative environment that encourages the exchange of ideas and the pursuit of innovative solutions.

Conclusion

Toshimitsu Yanagihara's contributions to the field of positive resist patterns exemplify his commitment to innovation and excellence. His patent and work at Tosoh Corporation highlight the importance of collaboration and creativity in driving advancements in technology.