Company Filing History:
Years Active: 1992-1999
Title: The Innovative Contributions of Toshiko Nakamura
Introduction
Toshiko Nakamura is a prominent inventor based in Yokkaichi, Japan. She has made significant contributions to the field of polymer science, particularly in the development of highly water-absorptive polymers. With a total of 4 patents to her name, her work has had a substantial impact on various applications in industry.
Latest Patents
Nakamura's latest patents include a highly water-absorptive polymer composition that boasts enhanced gel strength. This innovative polymer composition is designed to improve water absorption capabilities, making it highly valuable in various applications. Additionally, she has developed a process for producing highly water-absorptive polymers. This process involves subjecting a water-soluble ethylenically unsaturated monomer, primarily acrylic acid, to a water-in-oil type of reverse-phase polymerization. The method includes the use of a water-soluble radical polymerization initiator, a dispersant, and a hydrophobic hydrocarbon solvent to create a slurry of water-containing particles, which are then polymerized to form agglomerates of the highly water-absorptive polymer.
Career Highlights
Throughout her career, Toshiko Nakamura has worked with notable companies such as Mitsubishi Chemical Corporation and Mitsubishi Petrochemical Company Limited. Her experience in these organizations has allowed her to refine her expertise in polymer development and innovation.
Collaborations
Nakamura has collaborated with esteemed colleagues, including Kenji Yoshinaga and Kiichi Ito. These partnerships have fostered a collaborative environment that has led to groundbreaking advancements in her field.
Conclusion
Toshiko Nakamura's contributions to polymer science and her innovative patents highlight her role as a leading inventor in her field. Her work continues to influence the development of new materials with enhanced properties, showcasing the importance of innovation in science and technology.