Itami, Japan

Toshiki Ono


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 1993

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1 patent (USPTO):Explore Patents

Title: Innovator Insights: Toshiki Ono and His Contributions to Semiconductor Technology

Introduction: Toshiki Ono, an inventive mind based in Itami, Japan, has made significant strides in the field of semiconductor technology. With a passion for innovation, he has been able to develop a unique apparatus that addresses critical cleaning processes in semiconductor manufacturing.

Latest Patents: Ono holds a notable patent for a semiconductor wafer cleaning apparatus. This invention features an ice-making unit paired with a jet nozzle for ejecting fine ice particles against a wafer housed within a cleaning vessel. The design includes an exhaust chamber with an expanded portion linked to the cleaning vessel. Curved guide plates effectively direct the jet particles into the expanded portion, while a flow regulator plate—featuring numerous inverted frustum-shaped tapered holes—ensures optimal particle regulation in accordance with the downward flow direction. The innovative exhaust mechanism captures the upward flow along the chamber's side walls using stopper plates, allowing for efficient removal via exhaust ports.

Career Highlights: Toshiki Ono’s career is marked by his affiliation with Mitsubishi Electric Corporation, where he has contributed his expertise in semiconductor cleaning technologies. His work reflects a commitment to enhancing efficiency and effectiveness in critical manufacturing processes.

Collaborations: Throughout his career, Ono has collaborated with notable colleagues such as Shiro Yamasaki and Toshihiko Noguchi. These partnerships have fostered an environment of collective innovation and have played a pivotal role in the development of new technologies within the semiconductor industry.

Conclusion: The achievements of Toshiki Ono underscore the impact of innovation in semiconductor manufacturing. His patent for the wafer cleaning apparatus represents a significant advancement in the industry, highlighting the potential of collaborative efforts among forward-thinking engineers and inventors. As technology continues to evolve, Ono’s contributions are sure to influence the future of semiconductor production.

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