Toshikazu Umatate

Title: Toshikazu Umatate: Innovator in Pattern Forming Technology

Introduction

Toshikazu Umatate is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of pattern forming technology, holding a total of 7 patents. His innovative approaches have advanced the capabilities of various devices in the semiconductor industry.

Latest Patents

Umatate's latest patents include a pattern forming method and a method for producing devices. In his pattern forming method, a first L & S pattern is formed on a wafer. A first protective layer, a second L & S pattern with a perpendicular periodic direction to that of the first L & S pattern, and a photoresist layer are formed to cover the first L & S pattern. A third pattern with first apertures is created in the photoresist layer, overlapping with a part of the second L & S pattern. Second apertures are then formed in the first protective layer via the first apertures, allowing a part of the first L & S pattern to be removed through the second apertures. This process results in a pattern that includes a non-periodic portion finer than the resolution limit of an exposure apparatus. Another notable patent involves a mask substrate and a projection exposure apparatus equipped with the mask. This invention aims to reduce mask pattern transfer errors caused by the expansion of the mask substrate during the transfer of the circuit pattern onto the photosensitive substrate. The mask substrate is loosely supported on multiple mounts on the mask stage, allowing it to expand freely in response to temperature changes. A measuring instrument, such as a temperature sensor or interferometer, is utilized to measure the expansion amount of the mask substrate, ensuring precise alignment and positioning.

Career Highlights

Throughout his career, Umatate has worked with renowned companies such as Nikon Corporation and Nippon Kogaku K.K. His expertise in pattern forming technology has made him a valuable asset in the development of advanced imaging systems.

Collaborations

Umatate has collaborated with notable colleagues, including Yukio Kakizaki and Toru Kiuchi. Their combined efforts have contributed to the advancement of technology in their respective fields.

Conclusion

Toshikazu Umatate's innovative work in pattern forming technology has significantly impacted the semiconductor industry. His patents reflect a deep understanding of the complexities involved in device production, showcasing his