Company Filing History:
Years Active: 2003-2004
Title: The Innovations of Toshihura Furukawa
Introduction
Toshihura Furukawa is a notable inventor based in Essex Junction, VT (US). He has made significant contributions to the field of semiconductor technology. With a total of 2 patents, his work has had a considerable impact on the industry.
Latest Patents
Furukawa's latest patents focus on a method for forming a desired junction profile in a semiconductor device. The first patent describes a process where at least one dopant is introduced into a semiconductor substrate. This dopant is diffused in the substrate through annealing while simultaneously exposing the substrate to an electric field. This innovative approach enhances the efficiency of semiconductor devices.
Career Highlights
Furukawa is currently employed at International Business Machines Corporation, commonly known as IBM. His work at IBM has allowed him to explore and develop advanced semiconductor technologies. His contributions have been instrumental in pushing the boundaries of what is possible in the field.
Collaborations
Throughout his career, Furukawa has collaborated with esteemed colleagues such as Arne Watson Ballantine and John J Ellis-Monaghan. These collaborations have fostered an environment of innovation and creativity, leading to groundbreaking advancements in semiconductor technology.
Conclusion
Toshihura Furukawa's work exemplifies the spirit of innovation in the semiconductor industry. His patents and collaborations continue to influence the development of advanced technologies. His contributions are a testament to the importance of research and development in driving progress.