Satte, Japan

Toshihisa Katamine


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: Toshihisa Katamine: Innovator in Semiconductor Manufacturing

Introduction

Toshihisa Katamine is a notable inventor based in Satte, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the development of methods and systems for producing III-V Group compound semiconductors. His innovative approach has led to advancements in the efficiency and quality of semiconductor production.

Latest Patents

Toshihisa Katamine holds a patent for a "Method and system for manufacturing III-V Group compound semiconductor and III-V Group compound semiconductor." This patent describes a semiconductor manufacturing system utilizing Metal-Organic Chemical Vapor Deposition (MOCVD). The system features a lead-in member that guides feed gas onto the surface of a semiconductor substrate within a reactor. The lead-in member is designed as a hollow structure that forms a feed gas guide passage, equipped with multiple orifices. This design allows the feed gas to be jetted in a direction perpendicular to the prescribed flow, ensuring that the semiconductor substrate is uniformly bathed in the gas flow. The pressure differential created between the inner and outer sides of the nozzle member facilitates a consistent flow rate across the substrate's surface. This innovative method enables the individual leading of multiple feed gases to the substrate, promoting the formation of desired thin film crystals.

Career Highlights

Toshihisa Katamine is currently associated with Sumitomo Chemical Company, Limited, where he continues to advance semiconductor technology. His work has been instrumental in enhancing the manufacturing processes of compound semiconductors, which are crucial for various electronic applications.

Collaborations

Throughout his career, Toshihisa has collaborated with esteemed colleagues, including Yasushi Iyechika and Tomoyuki Takada. These collaborations have further enriched his research and development efforts in the semiconductor field.

Conclusion

Toshihisa Katamine's contributions to semiconductor manufacturing exemplify the importance of innovation in technology. His patented methods have paved the way for improved production techniques, showcasing his role as a key figure in the advancement of semiconductor technology.

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