Miho-mura, Japan

Toshihiro Sugiura


Average Co-Inventor Count = 2.0

ph-index = 2

Forward Citations = 10(Granted Patents)


Location History:

  • Inashiki, JP (1999)
  • Miho-mura, JP (2000)

Company Filing History:


Years Active: 1999-2000

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2 patents (USPTO):Explore Patents

Title: Innovations of Toshihiro Sugiura

Introduction

Toshihiro Sugiura is a notable inventor based in Miho-mura, Japan. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his expertise and innovative spirit.

Latest Patents

Sugiura's latest patents include a method of making a stacked thin film assembly and the stacked thin film assembly itself. The method involves creating a stacked film assembly for use as wiring in a semiconductor device, which consists of a bottom film (CVD-W film) and a top film (Al alloy film). The surface roughness (Ra) of the bottom film is less than 100 Å, and the crystal orientation of the top film is controlled. This innovation allows for the formation of a stacked film assembly that provides a satisfactory barrier function, sufficient electromagnetic resistance, and good film formation, even without lattice matching between the bottom and top films.

Career Highlights

Sugiura is currently employed at Texas Instruments Corporation, where he continues to develop cutting-edge technologies in the semiconductor industry. His work has been instrumental in advancing the capabilities of semiconductor devices.

Collaborations

Sugiura collaborates with Koichi Mizobuchi, contributing to the innovative projects at Texas Instruments Corporation.

Conclusion

Toshihiro Sugiura's contributions to semiconductor technology through his patents and work at Texas Instruments Corporation highlight his role as a key innovator in the field. His advancements in stacked thin film assemblies are paving the way for future developments in semiconductor devices.

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