Toshihiro Sasaya

Title: Toshihiro Sasaya: Innovator in Projection Exposure Technology

Introduction

Toshihiro Sasaya is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of projection exposure technology, holding a total of 5 patents. His work primarily focuses on enhancing the performance and accuracy of projection optical systems.

Latest Patents

One of his latest patents is titled "Projection exposure apparatus and method with adjustment of rotationally asymmetric optical characteristics." This invention describes a high-performance projection exposure apparatus that can adjust optical characteristics that are rotationally asymmetric with respect to the optical axis of the projection optical system. The apparatus includes an illumination optical system, a projection optical system, and a plurality of optical elements. These elements are designed to correct optical characteristics that remain in the projection optical system, ensuring high-quality image projection.

Another notable patent is the "Method of manufacturing and using correction member to correct aberration in projection exposure apparatus." This method involves providing a projection optical system that projects a pattern image formed on a mask onto a photosensitive substrate. A correction member is locally tooled to correct random aberration in the projection optical system, enhancing the overall performance of the exposure apparatus.

Career Highlights

Toshihiro Sasaya is currently employed at Nikon Corporation, a leading company in imaging and optical products. His innovative work has positioned him as a key figure in the development of advanced projection technologies.

Collaborations

Throughout his career, Sasaya has collaborated with notable colleagues, including Kazuo Ushida and Yutaka Suenaga. These collaborations have contributed to the advancement of projection exposure technology and have fostered a culture of innovation within the team.

Conclusion

Toshihiro Sasaya's contributions to projection exposure technology have significantly impacted the field. His innovative patents and collaborations with esteemed colleagues highlight his dedication to advancing optical systems. His work continues to influence the industry and pave the way for future innovations.