Yokohama, Japan

Toshihilo Nakata


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 27(Granted Patents)


Company Filing History:


Years Active: 1992

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1 patent (USPTO):Explore Patents

Title: Toshihilo Nakata: Innovator in Reticle Inspection Technology

Introduction

Toshihilo Nakata is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of optical inspection technology, particularly in the area of reticle inspection. His innovative approach has led to the development of a patented method that enhances the accuracy and efficiency of inspecting reticles used in semiconductor manufacturing.

Latest Patents

Nakata holds a patent for a "Method of inspecting reticles and apparatus therefor." This invention involves a sophisticated system that includes means for holding and transferring both an inspected reticle and a standard reticle. It also features means for illuminating light with spatial coherency adjusted onto both reticles, along with an objective lens for collecting transmitted or reflected light. The system is designed to detect defects or foreign substances on the inspected reticle by comparing electric signals obtained from the inspection process.

Career Highlights

Toshihilo Nakata is currently employed at Hitachi, Ltd., a leading technology company known for its advancements in various fields, including electronics and information technology. His work at Hitachi has allowed him to collaborate with other talented professionals in the industry, further enhancing his contributions to innovation.

Collaborations

Nakata has worked alongside notable colleagues such as Minori Noguchi and Hiroaki Shishido. Their combined expertise has fostered a collaborative environment that promotes the development of cutting-edge technologies in reticle inspection.

Conclusion

Toshihilo Nakata's innovative work in reticle inspection technology exemplifies the impact of dedicated inventors in advancing industrial processes. His patented method not only improves inspection accuracy but also contributes to the overall efficiency of semiconductor manufacturing.

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