Company Filing History:
Years Active: 2016-2023
Title: Innovations of Toshihiko Otsuki
Introduction
Toshihiko Otsuki is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of polishing agents and methods. With a total of four patents to his name, Otsuki's work has advanced the technology used in various polishing applications.
Latest Patents
Otsuki's latest patents focus on a polishing agent, polishing method, and liquid additive for polishing. The invention relates to a polishing agent that includes a water-soluble polymer, which is a copolymer of a monomer that consists of unsaturated dicarboxylic acid and a monomer that comprises an ethylenic double bond without an acidic group. Additionally, the polishing agent contains cerium oxide particles and water, with a pH range of 4 to 9. This innovative formulation enhances the effectiveness of polishing processes.
Career Highlights
Throughout his career, Toshihiko Otsuki has worked with prominent companies such as AGC Inc. and Asahi Glass Company, Limited. His experience in these organizations has allowed him to develop and refine his inventions in the polishing industry.
Collaborations
Otsuki has collaborated with notable coworkers, including Masaru Suzuki and Iori Yoshida. Their combined expertise has contributed to the successful development of innovative polishing solutions.
Conclusion
Toshihiko Otsuki's contributions to the field of polishing agents demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of materials and their applications in polishing technology.